Clasping folds enable superior elastic strength of graphene films

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All data supporting the findings of this study are available within the paper and the Supplementary Information or from the corresponding author upon request. Source data are provided with this paper.

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Acknowledgements

We thank X. Zhang for assistance with AFM measurements; G. Zhu and Q. Lin for assistance with TEM measurements; and Y. Qiu for help in conducting SAXS and wide-angle X-ray scattering measurements.

Funding

This work was financially supported by the National Key Research and Development Program of China (2022YFA1205300 and 2022YFA1205301), the National Natural Science Foundation of China (52122301, 52090030, 52090031, 52090032, 52502120, 52272046, 12425201 and 52302049), the ‘Pioneer’ and ‘Leading Goose’ R&D Program of Zhejiang (2023C01190 and 2026C02A1055), the Fundamental Research Funds for the Central Universities (226-2024-00074 and 226-2025-00219), the Space Application System of China Manned Space Program (CMSS-2024-4-A-013) and the National Key Basic Research Program of China through grant (2022YFA1205400). Computation was performed on the Explorer 1000 cluster system of the Tsinghua National Laboratory for Information Science and Technology.

Author information

Author notes

  1. These authors contributed equally: Lidan Wang, Yangchao Liao

Authors and Affiliations

  1. MOE Key Laboratory of Macromolecular Synthesis and Functionalization, International Research Center for X Polymers, Zhejiang Key Laboratory of Advanced Organic Materials and Technologies, Research Center for Advanced Fibers, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou, China

    Lidan Wang, Chenwei Shen, Lu Chen, Mingtao Zhang, Kaiwen Li, Peng Li, Yingjun Liu, Zhen Xu, Kai Pang & Chao Gao

  2. Applied Mechanics Laboratory, Department of Engineering Mechanics and Center for Nano and Micro Mechanics, Tsinghua University, Beijing, China

    Yangchao Liao, Jingjie Huang & Zhiping Xu

  3. School of Civil and Environment Engineering, Changsha University of Science and Technology, Changsha, China

    Yangchao Liao

  4. State Key Laboratory of Silicon and Advanced Semiconductor Materials and School of Materials Science & Engineering, Zhejiang University, Hangzhou, China

    Xing Li & Degong Ding

  5. Institute of Physics, Chinese Academy of Sciences, Beijing, China

    Li Peng

Authors

  1. Lidan Wang
  2. Yangchao Liao
  3. Jingjie Huang
  4. Chenwei Shen
  5. Lu Chen
  6. Xing Li
  7. Degong Ding
  8. Mingtao Zhang
  9. Li Peng
  10. Kaiwen Li
  11. Peng Li
  12. Yingjun Liu
  13. Zhen Xu
  14. Kai Pang
  15. Zhiping Xu
  16. Chao Gao

Contributions

L.W., Zhen Xu, K.P., Zhiping Xu and C.G. supervised the project. L.W. made the initial key finding. L.W., K.P. and Zhen Xu conceived the idea and designed the experiments. L.W., K.P. and Zhen Xu performed the experiments and characterizations. C.S., L.C., L.P. and K.L. assisted with AFM and TEM characterizations. D.D. and X.L. performed the in-situ TEM tensile experiments. M.Z. contributed to the analysis of SFGO nanosheet preparation. P.L. and Y. Liu assisted in FIB characterization. Y. Liao, J.H. and Zhiping Xu performed the theoretical analysis. L.W. wrote the initial draft of the manuscript, and L.W., Zhen Xu, K.P., Zhiping Xu and C.G. revised it. All authors discussed the results and approved the final version of the paper.

Corresponding authors

Correspondence to Zhen Xu, Kai Pang, Zhiping Xu or Chao Gao.

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Extended data figures and tables

Extended Data Fig. 1 AFM analyses of surface folds of SFGOs.

a, Photo of GO dispersion (0.1 mg ml−1) and its AFM image, height profile, 3D surface morphology (from top). b, Photos of dispersions (0.1 mg ml−1) and AFM images, height profiles, 3D surface morphologies (from top) for four SFGOs samples synthesized at decreased temperature: SFGO-1 (−5 °C), SFGO-2 (−10 °C), SFGO-3 (−15 °C) and SFGO-4 (−25 °C). The synthesis processes of four SFGO samples see details in Supplementary Experimental Section. c, The thickness of SFGO flakes as a function of reaction temperature. Data are presented as mean ± standard deviation (n = 30 independent samples). d, The fold width and length for four SFGO samples, statistically calculated from AFM analyses (b). e, Fold density for SFGO samples and GO.

Source data

Extended Data Fig. 2 Characterizations of lamellar crystallinity of SFGOs.

a, On-site photo of XRD testing for SFGO dispersion samples. b, XRD patterns of graphite, GO and SFGOs dispersions (at 20 mg ml−1). c,d, AC-TEM images of surface folds (c) and the stacking moiré pattern on planar surface (d) of SFGO-1 flake. e, Raman spectra of graphite, GO, SFGO-1, SFGO-2, SFGO-3 and SFGO-4. f, The ID/IG value and C/O ratio as a function of reaction temperature. ID/IG data are presented as mean ± standard deviation (n = 3 independent samples).

Source data

Extended Data Fig. 3 Raman analyses on the heterogeneous core-shell structure of SFGO.

a, The schematic process for sample preparation and Raman testing for a SFGO-4 flake. b,c, Typical Raman spectra collecting on surface (b) and core (c). d, The ID/IG distribution on surface and core by randomly selected 10 samplings. Data are presented as mean ± standard deviation (n = 10 independent samples).

Source data

Extended Data Fig. 4 TEM images and structural models.

a, RG film features some wrinkles on sheets. b, SFRG-1 film exhibits typical FCL structure. c, SFRG-4 film contains large voids and gaps, resulted by the  nonuniform stacking of intrinsically thick flakes.

Extended Data Fig. 5 Preparation and structural characterization of SFGO film.

a, Photograph of blade coating SFGO film. Scale bar, 10 cm. b,c, XRD patterns of SFGO-1 and GO film before (b) and after reduction (c). d, The corresponding interlayer spacing and grain size of SFRG-1 and RG film calculated from XRD spectra. e, Raman spectra of SFGO-1, SFRG-1, GO and RG film. f, WAXS patterns and azimuthal scan profiles (002 peak) of the SFRG-1 and RG film. WAXS patterns were recorded along the parallel direction with an incident Cu-Kα X-ray beam. g, XPS analyses of SFGO-1 and SFRG-1 film. h,i, The C1s spectra of SFGO-1 (h) and SFRG-1 (i) film. The broad C1s peak of SFGO films was fitted by three peaks at 284.3, 286.3, and 288.0 eV, corresponding to C(sp2)-C(sp2), C-O, and C-O-C, respectively. The proportion of C(sp2)-C(sp2) (57.9%) for SFGO films increased to 87.8% for SFRG film, indicating the substantial elimination of oxygen-containing groups of SFGO flakes by chemical reduction.

Source data

Extended Data Fig. 6 In-situ WAXS characterization of the elasticity in SFRG-1 film.

a, In-situ WAXS testing apparatus. b, WAXS patterns for the 002 peak of the SFRG-1 film during the loading (up) and unloading (down). c,d, Azimuthal scan profiles for the 002 peak during loading (c) and unloading (d). e, The degree of orientation of the SFRG-1 films as a function of elongation during loading and unloading process.

Source data

Extended Data Fig. 7 Configurations, stress distributions, and strain distributions of the single-layer folded GO model with W = 50 nm.

a, The three typical states of the system during the tensile process: the initial state, the maximum-stress state, and the interlayer interlock failure state. Here, W represents the width of a single fold, L0 = 360 nm denotes the initial length used to calculate the engineering strain ε = (L – L0) / L0, and L represents the span between loading points. b, Configurations, stress distributions, and strain distributions of the head-to-head zone indicated by the blue-dashed box in panel a during the tensile process. c, Configurations, stress distributions, and strain distributions of the head-to-tail zone indicated by the red dashed box in panel a during the tensile process.

Extended Data Fig. 8

Tensile curves obtained from experiments, and fitted to the “pull-to-push” and the “shear-lag” models under the same parameters, respectively.

Source data

Supplementary information

Source data

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Wang, L., Liao, Y., Huang, J. et al. Clasping folds enable superior elastic strength of graphene films. Nature 658, 643–649 (2026). https://doi.org/10.1038/s41586-026-11109-y

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